Photoresist Setup for n-Well Creation |
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download it and run it locally. To prepare the wafer for the creation of some n-wells, photoresist (shown in purple) is grown over the surface of the wafer. A mask is then dropped over the photoresist, and the exposed regions are softened with light. The softened regions are then washed away, leaving two holes in the photoresist. Note: Color shading is used to represent 3-dimensional shape. Different shades of the same color do not represent different layers, but are intended to help you understand the shape of the layer in question. For example, at the end of the video above, the darker brown color represents the top of the P- layer and is shaded a dark brown, while the side of the P- layer shown in cross-section is a lighter brown. |