Creation of Thick and Thinox



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A layer of thickox is grown over the entire wafer. This layer must now be etched to form the transistors. Photoresist is grown over the thickox (this is the starting point of the video). Then a mask is dropped over the photoresist so that portions of the photoresist may be etched away (see n-well setup video for details on etching photoresist with light). After the photoresist has been etched, the exposed regions of thickox are etched away and then the remaining photoresist is washed off (leaving no photoresist at all). A thinox layer is then grown in the etched regions.