In your presentation materials (some of which you will present) you need to include:
You have two outputs (the nFET current source and pFET current source) from a bootstrap current source, that uses cascoded current mirrors. You must provide any additional biasing circuitry, which also must simulate for your design. You might want to include a bootstrap current source in your simulations. At the top of your cell, you will have your positive (4.2um from left edge) and your negative (4.2um from right edge) inputs. At the bottom of your cell will be your outputs (in center of your cell no explicit placement), and your nFET bias (8.4um from left edge) / pFET bias (8.4um from right edge). Power will be at 13um from left edge and right edge, and gnd will be at the edges of the cell (which also connects to the tie downs). The output will be buffered in each cell, and then buffered through two amplifiers to the outside.
You may use anything available in the standard 0.35um double-poly TSMC process, but nothing else (i.e. there is no pbase layer). Your design must pass DRC rules completely. We will be able to choose the resistor to work for your particular application. You must provide any additional bias circuitry.
The height of your cell must be less than 0.9mm. You should attempt to minimize this parameter, and I will look at this parameter in analyzing your grade for this project.