Research Interests

Much of my research is focused on the fabrication and modeling of novel electronic devices. Fabrication of nano devices could potentially lead to the discovery of new physical phenomena. But fabricating these devices is challenging; careful process optimization (lithography, etch) is needed to achieve the desired structures. A few examples of my research are listed below.

Much of the research I do is enabled by the 100kV JEOL JBX-9300FS e-beam lithography system at Georgia Tech. This tool has demonstrated line-widths of less than 10nm; this may still not be sufficient for chip-manufacturing post-2020. So we recently started looking at the possibility of self-assembled resists.

My current focus on device modeling is related to graphene devices and related phenomena.

During my PhD years I worked on semiconductor device modeling. My thesis can be found here and identifies applications where accumulation devices (also called channel-counter-doped) can perform better than the traditional inversion devices. One of my modeling efforts identified a scale length that can be used to predict minimum channel length for a given combination of technology parameters.